We are pleased to announce that Dannon Group has established a strong and productive partnership with key government agencies in Nigeria. Our existing working relationships extend to the following MDAs:
- Ministry of Foreign Affairs: Our collaboration with the Ministry of Foreign Affairs enables us to provide seamless ICT biometric services to enhance the efficiency and security of diplomatic processes. Together, we strive to facilitate smooth operations and effective communication between Nigerian missions abroad and the Ministry.
- Nigerians in Diaspora Commission (NIDCOM): Dannon Group’s partnership with NIDCOM is focused on leveraging ICT biometric solutions to better serve Nigerians living outside the country. By working closely with NIDCOM, we aim to support the diaspora community by providing reliable and secure identity management services.
- Nigerian Embassies/High Commissions and Consulate Offices: Our partnership with Nigerian embassies, high commissions, and consulate offices is centred around strengthening identity verification processes and enhancing the security of consular services. We collaborate to deploy state-of-the-art biometric solutions that facilitate efficient visa processing, document authentication, and other consular operations.
- National Identity Management Commission (NIMC): Dannon Group has established a close working relationship with NIMC, which plays a crucial role in identity management within Nigeria. Through this partnership, we contribute our expertise in ICT biometric services to support NIMC’s efforts in ensuring accurate and secure identity registration, verification, and authentication for all Nigerians.
At Dannon Group, we are committed to delivering cutting-edge ICT biometric solutions in collaboration with these esteemed MDAs. Our partnerships aim to enhance national security, streamline processes, and provide reliable identity management services to the Nigerian populace. Together, we strive to drive technological innovation and promote efficiency in the public sector.